OPC / RET Technical Notes

This page contains technical notes related to OPC (Optical Proximity Correction), RET (Resolution Enhancement Technology), and lithography process optimization.

Lithography Simulation Software

• Overview
  • Lithography simulation software is used to model and predict photolithography processes in semiconductor manufacturing, including pattern printing, resolution limits, and process optimization.
  • Common applications include OPC/RET optimization, mask verification, and design-for-manufacturability (DFM).
• Common Tools
  • Synopsys
    • Sentaurus Lithography – OPC, mask optimization, and process simulation
    • Proteus – Full-chip lithography simulation and hotspot detection
    • Dr.LiTHO – Photoresist and focus/DOF simulation
  • ASML
    • Brion Lithography Simulation – Mask and scanner modeling
    • TWINSCAN OPC Tools – Scanner-linked lithography simulation
  • Siemens EDA (Mentor)
    • Calibre LFD – Lithography-friendly design verification
    • Calibre OPC / Workbench – Mask verification and OPC simulation
  • KLA / Applied Materials
    • PROLITH – Photoresist and optical imaging simulation
    • LithoAnalyzer / CLiC – OPC and resist modeling
• Advantages of Sentaurus Lithography
  • Accurate optical and photoresist modeling for advanced nodes
  • OPC and RET optimization with hotspot detection
  • Supports full-chip and critical-layer simulations
  • Automation via Python, Perl, or TCL scripting
  • Compatible with EUV and ArF immersion lithography
• Related Engineering Knowledge
  • Risk Analysis & FMEA – Identification of failure modes, impact assessment, and corrective actions to improve yield and reliability
  • Micro-Lithography & Optical Imaging – Understanding of resolution, numerical aperture, diffraction, and depth of focus
  • Process Trials & Reticle Characterization – Exposure/focus optimization and mask performance evaluation

Last updated: February 2026

↩ Go to OPC / RET Technical Notes Index
↩ Go to Home – Tech Notes Park